Interferograms analysis for measuring the thickness of aluminum thin films

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dc.contributor.affiliationPontificia Universidad Católica del Perú. Departamento de Ciencias
dc.contributor.authorChoque, I.
dc.contributor.authorAsmad, M.
dc.contributor.authorMiranda, J.
dc.contributor.authorQuispe, A.
dc.date.accessioned2026-03-13T16:58:33Z
dc.date.issued2023
dc.description.abstractIn this work, a specific procedure to measure the thickness of aluminum thin films by interferogram analysis is described. Six interferograms correspond to the image of the aluminum thin film superimposed with interference fringes are obtained from a Michelson-type interferential microscope. A six-frame phase shift algorithm is used to demodulate the optical phase. The measured phase is proportional to the height variation between the thin film wafer and the substrate. Finally, the obtained 3D height map permits us measure the thickness of the sample over an area of 1024 μm × 1280 μm.
dc.description.sponsorshipFunding: This work was supported by the Peruvión Council of Science, Technology and Technological Innovación [grant number PE501079762-2022-PROCIENCIA].
dc.identifier.doihttps://doi.org/10.1117/12.2672620
dc.identifier.urihttp://hdl.handle.net/20.500.14657/205935
dc.language.isoeng
dc.publisherSPIE
dc.relation.conferencenameProceedings of SPIE - The InterNational Society for Optical Engineering; Vol. 12618 (2023)
dc.relation.ispartofurn:isbn:978-1-5106-6194-3
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectAluminum thin films
dc.subjectThickness measurement
dc.subjectInterferogram analysis
dc.subject.ocdehttps://purl.org/pe-repo/ocde/ford#2.05.03
dc.titleInterferograms analysis for measuring the thickness of aluminum thin films
dc.typehttp://purl.org/coar/resource_type/c_5794
dc.type.otherComunicación de congreso
dc.type.versionhttps://vocabularies.coar-repositories.org/version_types/c_970fb48d4fbd8a85/

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