Ingeniería y Ciencia de los Materiales
URI permanente para esta colecciónhttp://54.81.141.168/handle/123456789/31431
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Ítem Texto completo enlazado Synthesis and characterization of nanostructured ternary MAX-phase thin films prepared by magnetron sputtering as precursors for twodimensional MXenes(Pontificia Universidad Católica del Perú, 2023-03-07) Miranda Marti, Marta; Grieseler, RolfMAX phase thin films can be fabricated through firstly depositing a precursor thin film consisting of the initial elements M, A, and X close to the MAX phase stoichiometry employing physical vapor deposition techniques with a subsequent thermal annealing process. This work presents different deposition configurations (multilayer and co-sputtering) for the fabrication of the Ti2AlC and Ti3AlC2 MAX phase thin films by magnetron sputtering from three elemental targets (Ti, Al, and C). It was found that the depositions followed mainly amorphous thus the MAX phase was not able to form. By implementing the deposition parameters such as temperature and substrate voltage, the deposition morphology could be tailored to crystalline and MAX phases could be created. Moreover, Ti2AlC and Ti3AlC2 nanostructured MAX phase thin films were fabricated by magnetron sputtering with three elemental targets (Ti, Al, and C) at oblique angle, resulting in a columnar thin film, and the properties of the thin film were described as a function of the column tilt angle. Lastly, the MAX phases at normal configuration and at oblique angle configuration were wet etched and the properties of the resulting MXene thin films were analyzed. It was demonstrated that only the surface of the sample was attacked by the etching solution. Thus, only the surface of the MAX phase was transformed into MXene. This hypothesis was verified by multiple characterizations such as e.g., X-Ray Diffraction and Raman spectroscopy to understand the possible morphology and chemical transformation and its influence on the etched thin film properties. The aim of this work is to unravel the connection between the morphology of the MAX phase thin films and the properties of the resulting MXenes. By understanding this relationship, it would be possible to tailor their features for specific applications.Ítem Texto completo enlazado Elaboración de copolímeros injertados a partir de macromonómeros de 2-ciclopropil-2-oxazolina(Pontificia Universidad Católica del Perú, 2017-09-20) Arenas Pancca, Elias; Rueda Sánchez, Juan CarlosLa síntesis de polímeros sensibles a estímulos es una de la más investigadas en el campo de la química de polímeros por su aplicación potencial en el campo de los biomateriales. Los polímeros sensibles a la temperatura presentan una temperatura de transición de fase (LSCT), son solubles en agua por debajo de su LCST y precipitan o se dispersan por encima de ella. La poli (2-ciclopropil-2-oxazolina) presenta un LCST alrededor de 30°C, cerca de la temperatura corporal humana, tiene un mecanismo de polimerización de carácter “vivo” y polimeriza más rápido que el resto de polioxazolinas, lo cual, la convierte en una excelente alternativa para la síntesis de nuevos polímeros sensibles a estímulos. En esta investigación se sintetizaron nuevos macromonómeros a partir de la 2-ciclopropil-2-oxazolina (cPrOx) mediante polimerización catiónica por apertura de anillo. La polimerización fue iniciada por el clorometilestireno (CMS) y finalizada con una solución de KOH en metanol. Se obtuvieron dos macromonómeros de cPrOx. Los grados de polimerización, calculados mediante espectroscopia por resonancia magnética nuclear (RMN), fueron de 13 y 25, adicionalmente los macromonómeros fueron caracterizados por espectrometría infrarroja con transformada de Fourier (FTIR) y su LCST fue determinada por turbidimetría. La LCST de los macromonómeros aumentó con el incremento del grado de polimerización (DP), 11.6°C y 18.0°C para DP de 13 y 25 respectivamente. Los macromonómeros sintetizados fueron utilizados posteriormente para sintetizar copolímeros injertados mediante polimerización por radicales libres de los mismos, conjuntamente con los monómeros: acrilato de sodio y acrilamida. Los copolímeros fueron caracterizados estructuralmente por RMN y FTIR y mediante ensayos turbidimetrícos. Los copolímeros presentaron sensibilidad a la temperatura y al pH, la sensibilidad al pH se debió a la presencia de acrilato de sodio en su composición y la sensibilidad a la temperatura se debió al macromonómero de CPrOx.Ítem Texto completo enlazado Synthesis and characterization of wide bandgap semiconductors doped with terbium for electroluminescent devices(Pontificia Universidad Católica del Perú, 2016-06-20) Montañez Huamán, Liz Margarita; Weingärtner, Roland; Hoppe, HaraldIn this work, stoichiometric, structural and light emission properties of amorphous wide bandgap semiconductor materials doped with terbium are presented. The amorphous nature of the thin films was confirmed by X-ray diffraction under grazing incidence. Fourier transform infrared spectroscopy spectra exhibit the formation of oxygen bonded elements and X-ray photoelectron spectroscopy reveals the formation of aluminum oxynitride and silicon oxycarbide as host matrices. The thin films were annealed at temperatures ranging from 300 °C to 1000 °C using a rapid thermal processing furnace. The highest light emission intensity for the case of aluminum oxynitride was obtained for terbium concentrations higher than 1 at% and for the annealing temperature at around 400 °C. Additionally, using the characterized films as active layer first electroluminescence devices were designed and investigated.Ítem Texto completo enlazado Structural, luminescence and Judd-Ofelt analysis to study the influence of post-annealing treatment on the AIN:Tb thin films prepared by radiofrequency magnetron sputtering(Pontificia Universidad Católica del Perú, 2016-06-20) Tucto Salinas, Karem Yoli; Weingärtner, RolandThis thesis investigates the effects of the annealing treatments on the spontaneous emission, radiative lifetime, composition and structure of terbium doped aluminum nitride films deposited on silicon substrates by radio frequency magnetron sputtering. The purpose of this thesis is to determine the Judd-Ofelt intensity parameters from the emission spectrum, in order to calculate the radiative lifetime, branching ratios and spontaneous emission probability. The optimal annealing temperature for the emission of terbium doped aluminum nitride is investigated. The annealing treatment was performed in the temperature range starting from 500 up to 1000°C. Two annealing techniques were investigated: rapid thermal processing and a rather slower quartz tube furnace. Furthermore, two heating approaches were applied: direct heating at 500, 750, 900 and 1000 °C, and multistep heating of 500-750°C, 750-900°C and 900-1000°C. The film was then characterized to determine which conditions resulted in the highest emission of Tb. The film characterization includes the use of X-ray diffraction to study the film’s crystal orientation, Energy dispersive X-ray spectroscopy to determine the film composition, Scanning electron microscopy and Reflection high-energy electron diffraction to resolve the surface morphology and structure of the film respectively. The luminescent intensity and the radiative lifetime were analyzed using cathodoluminescence measurement and Judd-Ofelt analysis. This work shows that the activation of the Tb ions to enhance the emitted cathodoluminescence intensity depends on the structure of the film and the oxygen concentration. The best annealing temperature to produce the highest emitted light intensity in this set of experiments were the single-step heating at 750°C using rapid thermal processing.