Ingeniería y Ciencia de los Materiales
URI permanente para esta colecciónhttp://54.81.141.168/handle/123456789/31431
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Ítem Texto completo enlazado Synthesis and characterization of nanostructured ternary MAX-phase thin films prepared by magnetron sputtering as precursors for twodimensional MXenes(Pontificia Universidad Católica del Perú, 2023-03-07) Miranda Marti, Marta; Grieseler, RolfMAX phase thin films can be fabricated through firstly depositing a precursor thin film consisting of the initial elements M, A, and X close to the MAX phase stoichiometry employing physical vapor deposition techniques with a subsequent thermal annealing process. This work presents different deposition configurations (multilayer and co-sputtering) for the fabrication of the Ti2AlC and Ti3AlC2 MAX phase thin films by magnetron sputtering from three elemental targets (Ti, Al, and C). It was found that the depositions followed mainly amorphous thus the MAX phase was not able to form. By implementing the deposition parameters such as temperature and substrate voltage, the deposition morphology could be tailored to crystalline and MAX phases could be created. Moreover, Ti2AlC and Ti3AlC2 nanostructured MAX phase thin films were fabricated by magnetron sputtering with three elemental targets (Ti, Al, and C) at oblique angle, resulting in a columnar thin film, and the properties of the thin film were described as a function of the column tilt angle. Lastly, the MAX phases at normal configuration and at oblique angle configuration were wet etched and the properties of the resulting MXene thin films were analyzed. It was demonstrated that only the surface of the sample was attacked by the etching solution. Thus, only the surface of the MAX phase was transformed into MXene. This hypothesis was verified by multiple characterizations such as e.g., X-Ray Diffraction and Raman spectroscopy to understand the possible morphology and chemical transformation and its influence on the etched thin film properties. The aim of this work is to unravel the connection between the morphology of the MAX phase thin films and the properties of the resulting MXenes. By understanding this relationship, it would be possible to tailor their features for specific applications.Ítem Texto completo enlazado Synthesis of Hydroxyapatite thin films on PMMA Printed Substrates(Pontificia Universidad Católica del Perú, 2018-01-19) Sauñi Camposano, Yesenia Haydee; Rädlein, Edda; Grieseler, RolfEach year millions of people suffer from bone defects resulting from trauma, tumors or bone-related injuries. Therefore there is a need to continuously develop new materials or improve the properties of the materials currently used, for bone replacement or implant applications. Polymethyl methacrylate (PMMA) has proven to be a promising alternative as a material for implants; however, there are still some limitations inherent to this material, particularly related to its surface properties. This thesis work is focused on the fabrication of hydroxyapatite (HAp) thin films on the surface of 3D printed PMMA substrates. 3D printing, particularly the Fused Deposition Modeling (FDM) technique was used to fabricate PMMA substrates with different surface porosity levels. FDM technique exhibits the potential for fabricating customized freeform structures for several applications including craniofacial reconstruction. HAp thin films were deposited by Radio Frequency Magnetron Sputtering (RFMS) and Ion Beam Sputtering (IBS) techniques, with a commercial target and an “in house” sintered target, respectively. A structural, chemical, mechanical, and morphological characterization was conducted in the generated surfaces by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), and hardness and roughness measurements. The results of the XRD analysis revealed an amorphous structure for the films produced by both RFMS and IBS techniques on the PMMA substrates. The micrographs obtained by SEM showed a columnar morphology and a low density for the films produced by RFMS; the same technique revealed a structure of ridges of standing platelets with curved contours for the IBS deposited films. The amorphous structure and the morphology of the films, as well as the hardness and roughness can be propitious to improve surface properties and promote the osseointegration capabilities of PMMA. This work contributes to the basis for the development of a PMMA implant manufacturing process using 3D printing and HAp film deposition techniques, with improved osseointegration properties.Ítem Texto completo enlazado Preparation and characterization of sputtered hydroxyapatite thin films(Pontificia Universidad Católica del Perú, 2018-01-19) Ugarte Díaz, Jorge Alfonso; Grieseler, Rolf; Schaaf, Peter; Rumiche Zapata, Francisco AurelioIn this work, hydroxyapatite (HAp) thin films were fabricated using two different sputtering techniques: Radio frequency magnetron sputtering and ion beam sputtering. In the first case, the films were grown on Ti-6Al-4V substrates using a high-purity commercial HAp target, obtaining a thickness ~200 nm. For the second method, the film were grown on pure titanium substrates using a self-produced HAp target. This target was fabricated with powders (Ca/P = 1.628, sintered and crushed). Here, the thickness of the fabricated film was ~300 nm. The sintering tests for the target fabrication were carried out using two different heating regimens at a maximum temperature of 1200 °C (holding time of 2h and 4h) using various additives. As additives, water (H2O), polyvinyl alcohol (PVA) and polyethylene glycol (PEG) were used to improve the mechanical strength of the green discs. The as-deposited films were amorphous in both cases. Therefore, the films were annealed to increase the crystallinity. Annealing was performed in air for 2h at temperatures: 400, 600 and 800 °C for RF-magnetron sputter samples; 600 and 800 °C for ion beam sputter samples. The result of the films shows in both cases that the crystallinity of HAp was improved only for the annealed samples fabricated with ion beam sputtering at 800 °C. In both cases energy dispersive X-ray spectroscopy measurements show a decrease in Ca/P ratio with increasing the temperature. Hardness results revealed an increase in this with the increase in temperature possibly due to the formation of titanium oxide. The roughness for the fabricated films with the RFmagnetron sputtering increases till an annealing temperature of 600 °C and then decreases till 800 °C, while the roughness for the fabricated films with ion beam sputtering is higher in the as-deposited samples and then this is reduced by increasing the annealing temperature.